Contact hole reticle optimization by using interference mapping lithography (IML)

Physics

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

5

Scientific paper

The theory of interference mapping lithography (IML) is presented for low k1 (k1<0.4) contact hole imaging. IML with a coherent source is shown to be analogous to methods used in creating a Fresnel lens. With IML for a partially coherent source, the interference map is calculated by using the first eigenfunction of the transmission cross coefficient (TCC). From this interference map, clear 0° AFs and for clear 180° AFs are placed in the optimal location. Thus, IML is a method to place AFs via a model. From the interference map, a method for creating a CPL mask is demonstrated. Using IML, techniques to optimize a binary mask or a CPL mask are presented for maximizing the exposure latitude (EL) or depth of focus (DOF). These techniques are verified with simulation. Using IML for maximum EL, a CPL mask with 100nm (k1=0.39) contacts was created and exposed on an ASML /1100 ArF scanner using NA of 0.75 and Quasar illumination (σin=0.72, σout=0.92, span angle=20°). Measurements on the exposed wafers show that IML CPL results in printing 100nm contacts through pitch (200nm minimum pitch to isolated) with 0.45μm DOF at 10% EL.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Contact hole reticle optimization by using interference mapping lithography (IML) does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Contact hole reticle optimization by using interference mapping lithography (IML), we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Contact hole reticle optimization by using interference mapping lithography (IML) will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-1553184

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.