Astronomy and Astrophysics – Astronomy
Scientist
Astronomy and Astrophysics
Astronomy
Scientist
U.S. Navy, Naval Research Laboratory, Washington, DC
School of Earth and Space Sciences, University of Science and Technology of China, Hefei 230026, PR China
ASML MaskTools, Inc., USA
ASML, USA and Motorola, USA
ASML MaskTools
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Calculations on the Low Energy States and the K-Alpha K-Beta Lines of FE+24 and FE+25 Method of Relativistic Perturbation
Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)
Contact hole reticle optimization by using interference mapping lithography (IML)
Contact hole reticle optimization by using interference mapping lithography (IML)
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