Statistics – Methodology
Scientist
Statistics
Methodology
Scientist
ASML MaskTools, Inc., USA
ASML, USA and Motorola, USA
Contact hole reticle optimization by using interference mapping lithography (IML)
Contact hole reticle optimization by using interference mapping lithography (IML)
Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
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