Physics
Optics
Scientist
Freescale Semiconductor, Inc., USA
Freescale Semiconductor, USA
ASML, USA and Motorola, USA
Assessment of 5-pole illumination for 65nm-node contact holes
Contact hole reticle optimization by using interference mapping lithography (IML)
Everything you ever wanted to know about why the semiconductor industry needs a high-refractive index photoresist but were afraid to ask: Part I
High transmission mask technology for 45nm node imaging
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