Experimental Persistence Probability for Fluctuating Steps

Details Experimental Persistence Probability for Fluctuating Steps Experimental Persistence Probability for Fluctuating Steps

2002-09-04

arxiv.org/abs/cond-mat/0209068v2

Phys.Rev.Lett. 89, 136102 (2002)

Physics

Condensed Matter

Statistical Mechanics

LaTeX, 11 pages, 4 figures, minor changes in References section

Scientific paper

10.1103/PhysRevLett.89.136102

The persistence behavior for fluctuating steps on the $Si(111)$ $(\sqrt3 \times \sqrt3)R30^{0} - Al$ surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970K. The measured persistence probability follows a power law decay with an exponent of $\theta=0.77 \pm 0.03$. This is consistent with the value of $\theta= 3/4$ predicted for attachment/detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed reference position, the measured persistence probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations.

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