Deposition of SiOx films by means of atmospheric pressure microplasma jets

Details Deposition of SiOx films by means of atmospheric pressure microplasma jets Deposition of SiOx films by means of atmospheric pressure microplasma jets

2011-05-13

arxiv.org/abs/1105.2691v1

Physics

Plasma Physics

5 pages, 5 figures, contribution at SAPP XVIII 2011 conference, Vratna Dolina, Mala Fatra, Slovakia

Scientific paper

Atmospheric pressure plasma jet sources are currently in the focus of many researchers for their promising applications in medical industry (e.g. treatment of living tissues), surface modification or material etching or synthesis. Here we report on the study of fundamental principles of deposition of SiOx films from microplasma jets with admixture of hexamethyldisiloxane [(CH3)3SiOSi(CH3)3, HMDSO] molecules and oxygen. The properties of the deposited films, the composition of the plasma as measured by molecular beam mass spectrometry and the effect of additional treatment of grown film by oxygen or hydrogen atoms will be presented.

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