CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties

Details CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties

2006-05-24

arxiv.org/abs/cond-mat/0605600v1

Mater. Sci. Forum 514-516 (2006) 289

Physics

Condensed Matter

Materials Science

5 pages, 6 figures

Scientific paper

This work reports on the synthesis of CrO2 thin films by atmospheric pressure CVD using chromium trioxide (CrO3) and oxygen. Highly oriented (100) CrO2 films containing highly oriented (0001) Cr2O3 were grown onto Al2O3(0001) substrates. Films display a sharp magnetic transition at 375 K and a saturation magnetization of 1.92 Bohr magnetons per f.u., close to the bulk value of 2 Bohr magnetons per f.u. for the CrO2. Keywords: Chromium dioxide (CrO2), Atmospheric pressure CVD, Spintronics.

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