Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

Details Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

2011-03-10

arxiv.org/abs/1103.1975v1

Microelectronic Engineering 88 (2011) 1569--1572

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

Scientific paper

10.1016/j.mee.2011.03.011

We investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-\mu m scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05-2 \mu m range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes exhibit weakly conductive halos at the sub-\mu m scale, and can thus be used to achieve resist-free electrical contacts for transport measurements at the sub-\mu m scale. Four-point transport measurements using \mu m-spaced EBID contacts are provided in the case of a multiwalled carbon nanotube.

Affiliated with

Also associated with

No associations

Rating

Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-630625