Atomic layer deposition of HfO2 on graphene from HfCl4 and H20

Details Atomic layer deposition of HfO2 on graphene from HfCl4 and H20 Atomic layer deposition of HfO2 on graphene from HfCl4 and H20

2010-05-10

arxiv.org/abs/1005.1469v1

Physics

Condensed Matter

Materials Science

4 figures, accepted by CEJP

Scientific paper

Atomic layer deposition of ultrathin HfO2 on unmodified graphene from HfCl4 and H2O was investigated. Surface RMS roughness down to 0.5 nm was obtained for amorphous, 30 nm thick hafnia film grown at 180 degrees C. HfO2 was deposited also in a two-step temperature process where the initial growth of about 1 nm at 170 degrees C was continued up to 10-30 nm at 300 degrees C. This process yielded uniform, monoclinic HfO2 films with RMS roughness of 1.7 nm for 10-12 nm thick films and 2.5 nm for 30 nm thick films. Raman spectroscopy studies revealed that the deposition process caused compressive biaxial strain in graphene whereas no extra defects were generated. An 11 nm thick HfO2 film deposited onto bilayer graphene reduced the electron mobility by less than 10% at the Dirac point and by 30-40% far away from it.

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