Mid-infrared Hall effect in thin-film metals: Probing the Fermi surface anisotropy in Au and Cu

Details Mid-infrared Hall effect in thin-film metals: Probing the Fermi surface anisotropy in Au and Cu Mid-infrared Hall effect in thin-film metals: Probing the Fermi surface anisotropy in Au and Cu

1999-07-14

arxiv.org/abs/cond-mat/9907210v1

Physics

Condensed Matter

Materials Science

14 pages of text, 5 figures

Scientific paper

10.1103/PhysRevB.61.8133

A sensitive mid-infrared (MIR, 900-1100 cm-1, 112-136 meV) photo-elastic polarization modulation technique is used to measure simultaneously Faraday rotation and circular dichroism in thin metal films. These two quantities determine the complex AC Hall conductivity. This novel technique is applied to study Au and Cu thin films at temperatures down to 20 K and magnetic fields up to 8 T. The Hall frequency is consistent with band theory predictions. We report the first measurement of the MIR Hall scattering rate, which is significantly lower than that derived from Drude analysis of zero magnetic field MIR transmission measurements. This difference is qualitatively explained in terms of the anisotropy of the Fermi surface in Au and Cu.

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