Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

Details Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

2010-06-24

arxiv.org/abs/1006.4736v2

Jornal of Micromechanics and Microengineering, Vol 20, Number 12, 125015, (2010), 14 Pages

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

10 figures, 51 references

Scientific paper

10.1088/0960-1317/20/12/125015

We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were fabricated by the application of an intrinsic proximity effect suppression procedure which makes the need for an elaborated correction algorithm redundant for planar design layouts which are orders of magnitude smaller than the backscattering length. In addition, we discuss the necessary considerations for extending the fabrication spatial scale of optical contactlithography with a mercury arc-discharge photon source down to the order of the exposure photon's wavelength ( sub-{\mu}m ), thereby minimizing the writing time on the electron-beam lithograph. Finally we developed a unique and novel technique for controlling the undercut during a planar lift-off fabrication procedure without cleaving the wafer.

Affiliated with

Also associated with

No associations

Rating

Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-675632