Dynamics of Rough Interfaces in Chemical Vapor Deposition: Experiments and a Model for Silica Films

Details Dynamics of Rough Interfaces in Chemical Vapor Deposition: Experiments and a Model for Silica Films Dynamics of Rough Interfaces in Chemical Vapor Deposition: Experiments and a Model for Silica Films

2000-03-09

arxiv.org/abs/cond-mat/0003155v1

Physics

Condensed Matter

Statistical Mechanics

5 two-column pages, Revtex, 5 figures, to appear in Phys. Rev. Lett

Scientific paper

10.1103/PhysRevLett.84.3125

We study the surface dynamics of silica films grown by low pressure chemical vapor deposition. Atomic force microscopy measurements show that the surface reaches a scale invariant stationary state compatible with the Kardar-Parisi-Zhang (KPZ) equation in three dimensions. At intermediate times the surface undergoes an unstable transient due to shadowing effects. By varying growth conditions and using spectroscopic techniques, we determine the physical origin of KPZ scaling to be a low value of the surface sticking probability, related to the surface concentration of reactive groups. We propose a stochastic equation that describes the qualitative behavior of our experimental system.

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