Photoemission from clean and oxygen-covered ultrafine nickel particles

Details Photoemission from clean and oxygen-covered ultrafine nickel particles Photoemission from clean and oxygen-covered ultrafine nickel particles

Oct 1991

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991phrvb..44.8284m&link_type=abstract

Physical Review B (Condensed Matter), Volume 44, Issue 15, October 15, 1991, pp.8284-8287

Physics

Condensed Matter

9

Scientific paper

Ultrafine nickel particles are produced in ultrapure helium. The measured photothreshold and photoelectric yield of clean nickel particles are found to be in fairly good agreement with theoretical calculations based on a three-step model using density-of-states data of a flat surface. The photothreshold change due to oxygen adsorption on nickel particles was measured. It shows qualitatively the same behavior as on a flat surface but with a sticking coefficient that is smaller by a factor of 500 compared with the one on a flat Ni(110) surface. The formation of NiO is found to influence the experiment at high surface coverage.

Affiliated with

Also associated with

No associations

Rating

Photoemission from clean and oxygen-covered ultrafine nickel particles does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Photoemission from clean and oxygen-covered ultrafine nickel particles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoemission from clean and oxygen-covered ultrafine nickel particles will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1876809