Physics – Optics
Scientific paper
1998-04-02
Physics
Optics
10 pages, 11 figures, REVTeX, to be published in Applied Optics
Scientific paper
10.1364/AO.37.004160
Reliable control of the deposition process of optical films and coatings frequently requires monitoring of the refractive index profile throughout the layer. In the present work a simple in situ approach is proposed which uses a WKBJ matrix representation of the optical transfer function of a single thin film on a substrate. Mathematical expressions are developed which represent the minima and maxima envelopes of the curves transmittance-vs-time and reflectance-vs-time. The refractive index and extinction coefficient depth profiles of different films are calculated from simulated spectra as well as from experimental data obtained during PECVD of silicon-compound films. Variation of the deposition rate with time is also evaluated from the position of the spectra extrema as a function of time. The physical and mathematical limitations of the method are discussed.
Martinu Ludvik
Poitras Daniel
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