Vicinal silicon surfaces: from step density wave to faceting

Details Vicinal silicon surfaces: from step density wave to faceting Vicinal silicon surfaces: from step density wave to faceting

2007-06-15

arxiv.org/abs/0706.2265v1

Physical Review B 76 045402 (2007)

Physics

Condensed Matter

Materials Science

26 pages, 9 figures

Scientific paper

10.1103/PhysRevB.76.045402

This paper investigates faceting mechanisms induced by electromigration in the regime where atomic steps are transparent. For this purpose we study several vicinal orientations by means of in-situ (optical diffraction, electronic microscopy) as well as ex-situ (AFM, microprofilometry) visualization techniques. The data show that faceting proceeds in two stages. The first stage is short and leads to the appearance of a step density wave, with a wavelength roughly independent of the surface orientation. The second stage is much slower, and leads to the formation of a hill-and-valley structure, the period of which depends on the initial surface orientation. A simple continuum model enables us to point out why the wavelength of the step density wave does not depend on the microscale details of the surface. The final wavelength is controlled by the competition between elastic step-step interaction and facet edge energy cost. Finally, the surface stress angular dependence is shown to emerge as a coarsed-grained picture from the step model.

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