Ultrafast Large Area Micropattern Generation in Non-absorbing Polymer Thin-Films by Pulsed Laser Diffraction

Details Ultrafast Large Area Micropattern Generation in Non-absorbing Polymer Thin-Films by Pulsed Laser Diffraction Ultrafast Large Area Micropattern Generation in Non-absorbing Polymer Thin-Films by Pulsed Laser Diffraction

2011-01-27

arxiv.org/abs/1101.5283v1

Physics

Condensed Matter

Soft Condensed Matter

23 pages

Scientific paper

10.1002/smll.201001939

We report an ultrafast, parallel and beyond-the-master micro-patterning technique for ultrathin (30 nm-400 nm) non-absorbing polymer films by diffraction of a laser light through a two dimensional periodic aperture. The redistribution of laser energy absorbed by the substrate causes self-organization of polymer thin-film in the form of wrinkle like surface relief structures caused by localized melting and freezing of the thin-film. Unlike the conventional laser ablation and laser writing processes, low laser fluence is employed to only passively swell the polymer as a pre-ablative process without the loss of material, and without absorption/reaction with the incident radiation. Self-organization in the thin polymer film aided by the diffraction pattern produces micro-structures made up of thin raised lines. These regular microstructures have far more complex morphologies than the mask geometry and very narrow line widths that can be an order of magnitude smaller than the openings in the mask. The microstructure morphology is easily modulated by changing the film thickness, aperture size and geometry and by changing the diffraction pattern, e.g., by changing the aperture-substrate distance.

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