Transparent yttrium hydride thin films prepared by reactive sputtering

Details Transparent yttrium hydride thin films prepared by reactive sputtering Transparent yttrium hydride thin films prepared by reactive sputtering

2011-02-02

arxiv.org/abs/1102.0450v2

Journal of Alloys and Compounds 509S, 2011, S812-S816

Physics

Condensed Matter

Materials Science

Scientific paper

10.1016/j.jallcom.2010.12.032

Metal hydrides have earlier been suggested for utilization in solar cells. With this as a motivation we have prepared thin films of yttrium hydride by reactive magnetron sputter deposition. The resulting films are metallic for low partial pressure of hydrogen during the deposition, and black or yellow-transparent for higher partial pressure of hydrogen. Both metallic and semiconducting transparent YHx films have been prepared directly in-situ without the need of capping layers and post-deposition hydrogenation. Optically the films are similar to what is found for YHx films prepared by other techniques, but the crystal structure of the transparent films differ from the well-known YH3 phase, as they have an fcc lattice instead of hcp.

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