The High Field Magnetization in the RF Sputter Deposited Copper Ferrite Thin Films

Details The High Field Magnetization in the RF Sputter Deposited Copper Ferrite Thin Films The High Field Magnetization in the RF Sputter Deposited Copper Ferrite Thin Films

2010-10-09

arxiv.org/abs/1010.1881v1

Physics

Condensed Matter

Strongly Correlated Electrons

5 pages, 3 figures

Scientific paper

Copper ferrite thin films were deposited on amorphous quartz substrates. The as deposited films were annealed in air and either quenched or slow cooled. Magnetization studies were carried out on the as deposited as well as annealed films using a SQUID magnetometer. The M-H curves were measured up to a field of 7T, at temperatures varying from 5K to 300K. The magnetization in the films did not saturate, even at the highest field. The expression, M(H)= Q(1- a/H^n) fitted the approach to saturation best with n=1/2, for all films and at all temperatures. The coefficient a was the highest for the as deposited film and was the smallest for the quenched film. In the case of as deposited film, the value of coefficient a increased with increasing temperature, while for the annealed films, the value of a showed a decrease as temperature increases.

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