Tailoring Nanostructures Using Copolymer Nanoimprint Lithography

Details Tailoring Nanostructures Using Copolymer Nanoimprint Lithography Tailoring Nanostructures Using Copolymer Nanoimprint Lithography

2012-03-23

arxiv.org/abs/1203.5318v1

Physics

Condensed Matter

Soft Condensed Matter

12 pages, 4 figures; Advanced Materials 2012

Scientific paper

10.1002/adma.201103532

Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work, we report on a novel technique to direct self-assembled structures of block copolymers by NanoImprint Lithography. Surface energy of a reusable mold and nanorheology are used to organize the copolymers in defect-free structures over tens of micrometers in size. Versatile and controlled in-plane orientations of about 25 nm half-period lamellar nanostructures are achieved and, in particular, include applications to circular tracks of magnetic reading heads.

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