Superior performance of multilayered fluoropolymer films in low voltage electrowetting

Details Superior performance of multilayered fluoropolymer films in low voltage electrowetting Superior performance of multilayered fluoropolymer films in low voltage electrowetting

2011-10-18

arxiv.org/abs/1110.4075v1

Physics

Condensed Matter

Soft Condensed Matter

Scientific paper

The requirement for low operational voltage in electrowetting devices, met using thin dielectrics, is usually connected with serious material failure issues. Dielectric breakdown (visible as electrolysis) is frequently evident slightly beyond the onset of the contact angle saturation. Here, plasma enhanced chemical vapor deposition (PECVD) is used to deposit thin fluorocarbon films prior to the spin-coating of Teflon\textregistered amorphous fluoropolymer on tetraethoxysilane (TEOS) substrates. The resulting multilayered hydrophobic top coating improves the electrowetting performance of the stack, by showing high resistance to dielectric breakdown at high applied voltages and for continuous long term application of DC and AC voltage. Leakage current measurements during electrowetting experiments with the proposed composite coating showed that current remains fairly constant at consecutive electrowetting tests in contrast to plain Teflon\textregistered coating in which material degradation is evident by a progressive increase of the leakage current after multiple electrowetting tests. Since the proposed composite coating demonstrates increased resistance to material failure and to dielectric breakdown even at thin configurations, its integration in electrowetting devices may impact their reliability, robustness and lifetime.

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