Studying Density VS Ar-pressures for optimization of DC-magnetron sputter deposition of Ni/C multilayers for hard x-ray telescopes

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Scientific paper

The influence of varying the Ar-pressure in the process of depositing Ni/C multilayers by dc-magnetron sputtering has been studied, and atomic force microscopy (AFM) measurements, x-ray characterization results and transmission electron microscopy (TEM) results are presented. Single Ni and C films and Ni/C multilayers were deposited at Ar-pressures of 1.5, 3, 5 and 7 mTorr. The one-dimensional power spectral density data from the AFM measurements clearly indicate that the best densities and thin film qualities for both materials are obtained at lower Ar-pressure, i.e. 1.5 mTorr.

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