Stress-induced traps in multilayered structures

Details Stress-induced traps in multilayered structures Stress-induced traps in multilayered structures

2011-06-27

arxiv.org/abs/1106.5307v1

Journal of Applied Physics 109, 013717, 2011

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

37 pages, 9 figures

Scientific paper

The trap parameters of defects in Si/CaF2 multilayered structures were determined from the analysis of optical charging spectroscopy measurements. Two kinds of maxima were observed. Some of them were rather broad, corresponding to "normal" traps, while the others, very sharp, were attributed to stress-induced traps. A procedure of optimal linear smoothing the noisy experimental data has been developed and applied. This procedure is based on finding the minimal value of the relative error with respect to the value of the smoothing window. In order to obtain a better accuracy for the description of the trapping-detrapping process, a Gaussian temperature dependence of the capture crosssections characterizing the stress-induced traps was introduced. Both the normal and the stress-induced traps have been characterized, including some previously considered as only noise features.

Affiliated with

Also associated with

No associations

Rating

Stress-induced traps in multilayered structures does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Stress-induced traps in multilayered structures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stress-induced traps in multilayered structures will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-638080