Strain induced pressure effect in pulsed laser deposited thin films of the strongly correlated oxide V2O3

Details Strain induced pressure effect in pulsed laser deposited thin films of the strongly correlated oxide V2O3 Strain induced pressure effect in pulsed laser deposited thin films of the strongly correlated oxide V2O3

2006-09-14

arxiv.org/abs/cond-mat/0609342v1

Physics

Condensed Matter

Strongly Correlated Electrons

Scientific paper

10.1103/PhysRevB.74.195109

V2O3 thin films about 10 nm thick were grown on Al2O3 (0001) by pulsed laser deposition. The XRD analysis is in agreement with R-3c space group. Some of them exhibit the metal / insulator transition characteristic of V2O3 bulk material and others samples exhibit a metallic behavior. For the latter, the XPS analysis indicates an oxidation state of +III for vanadium. There is no metal / insulator transition around 150 K in this sample and a strongly correlated Fermi liquid rho = AT2 behavior of the resistivity at low temperature is observed, with a value of A of 1.2 10-4 ohm cm, 3 times larger than the bulk value at 25 kbar.

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