Physics
Scientific paper
Aug 2000
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4178...51m&link_type=abstract
Proc. SPIE Vol. 4178, p. 51-58, MOEMS and Miniaturized Systems, M. Edward Motamedi; Rolf Goering; Eds.
Physics
5
Scientific paper
We are developing a lithography process for a 2D array of microshutters which can be used as a high efficiency, high contrast field selection device for a multi-objects spectrometer for the Next Generation Space Telescope. The device is a close- packed array of shutters with an individual shutter size of 100 micrometers square and area filling factor of about 80 percent, produced in a 100 micrometers thick silicon wafer. Our current array size is 128 by 128. Ech shutter made of silicon nitride with an appropriate optical coating, pivots on a torsion flexure along one edge. A CMOS circuit embedded in the frame around the shutters allows individual selection. An original double-shutter mechanism is employed for actuation. Processing includes anisotropic back etching for wafer thinning, a DRIE back etch through the silicon to the mechanical active nitride membrane and a RIE to produce the shutters out of the nitride membrane. Our layout is based on a detailed mechanical analysis for which we determined crucial material parameters experimentally.
Fettig Rainer K.
Kutyrev Alexander S.
Li Mary J.
Moseley Samuel Harvey
Mott David B.
No associations
LandOfFree
Status of the development of a 128x128 microshutter array does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.
If you have personal experience with Status of the development of a 128x128 microshutter array, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Status of the development of a 128x128 microshutter array will most certainly appreciate the feedback.
Profile ID: LFWR-SCP-O-894800