Selective Epitaxial Growth of GaAs on Ge Substrates with a SiO2 Pattern

Details Selective Epitaxial Growth of GaAs on Ge Substrates with a SiO2 Pattern Selective Epitaxial Growth of GaAs on Ge Substrates with a SiO2 Pattern

2007-03-26

arxiv.org/abs/cond-mat/0703664v1

Proceedings of the 210th Meeting of The Electrochemical Society, Cancun, Mexico, October 29-November 3, 2006

Physics

Condensed Matter

Materials Science

7 pages, 6 figures

Scientific paper

We have selectively grown thin epitaxial GaAs films on Ge substrates with the aid of a 200 nm thin SiO2 mask layer. The selectively grown structures have lateral sizes ranging from 1 um width up to large areas of 1 by 1 mm2. The growth is fully selective, thanks to an optimized growth procedure, consisting of a 13 nm thin nucleation layer grown at high pressure, followed by low pressure growth of GaAs. This growth procedure inhibits the nucleation of GaAs on the mask area and is a good compromise between reduction of loading effects and inhibition of anti phase domain growth in the GaAs. Nevertheless, both microscopic and macroscopic loading effects can still be observed on x-section SEM images and profilometer measurements. X-ray diffraction and low temperature photoluminescence measurements demonstrate the good microscopic characteristics of the selectively grown GaAs.

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