Physics – Optics
Scientific paper
Jan 1992
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1992spie.1604...67h&link_type=abstract
Proc. SPIE Vol. 1604, p. 67-77, 11th Annual BACUS Symposium on Photomask Technology, Kevin C. McGinnis; Ed.
Physics
Optics
1
Scientific paper
Recent work has demonstrated the high resolution optical performance possible with simple 1X mostly-reflective optics: using 248 nm light from a mercury arc lamp, 0.25 micrometers features were delineated across a 2 mm radius semicircular field, and much large fields are possible with a scaled up version. The mask required for this system consists of a quartz substrate, a patterned thin film reflector, and a nonreflective backing which also serves to protect the reflector film. The mask is reflective at the quartz/reflector interface so the substrate is part of the projection optical path and so acts as the pellicle. We have investigated chromium, silicon, and aluminum for the reflector material; their reflection coefficients at 248 nm at the quartz-reflector interface are 30, 55, and 90 percent, respectively. Silicon has been chosen because it has a practical combination of reflectivity and ease of deposition and etching. Moreover films as thin as 30 nm provide the full (bulk-value) reflection and so precise etching is further facilitated. Among possible absorber materials, novolak photoresist is a practical choice having a quartz/film reflectivity of 1%. Features down to 0.25 micrometers are regularly patterned for these masks with a MEBES I using Shipley SAL-601 or PMMA electron beam resist.
Browning Raymond
Hsieh Robert L.
Jerabek Paul
Lee Julienne Y.
Maluf Nadim I.
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