Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model

Details Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model

Feb 2009

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2009njph...11b3039b&link_type=abstract

New Journal of Physics, Volume 11, Issue 2, pp. 023039 (2009).

Physics

4

Scientific paper

The physical processes in an Ar/N2 magnetron discharge used for the reactive sputter deposition of TiNx thin films were simulated with a 2d3v particle-in-cell/Monte Carlo collisions (PIC/MCC) model. Cathode currents and voltages were calculated self-consistently and compared with experiments. Also, ion fractions were calculated and validated with mass spectrometric measurements. With this PIC/MCC model, the influence of N2/Ar gas ratio on the particle densities and fluxes was investigated, taking into account the effect of the poisoned state of the target.

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