Random Deposition Model with a Constant Capture Length

Details Random Deposition Model with a Constant Capture Length Random Deposition Model with a Constant Capture Length

2004-09-02

arxiv.org/abs/cond-mat/0409048v2

Prog. Theor. Phys. 113, 15-28 (2005)

Physics

Condensed Matter

Statistical Mechanics

14 pages, minor corrections. Accepted for publication in Progress of Theoretical Physics

Scientific paper

10.1143/PTP.113.15

We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance \ell, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.

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