Production of ordered silicon nanocrystals by low-energy ion sputtering

Physics – Condensed Matter – Materials Science

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4 two-column pages (revtex4), 3 figures (higher quality copies in the printed jrnl. version)

Scientific paper

10.1063/1.1372358

We report on the production of ordered assemblies of silicon nanostructures by means of irradiation of a Si(100) substrate with 1.2 keV Ar ions at normal incidence. Atomic Force and High-Resolution Transmission Electron microscopies show that the silicon structures are crystalline, display homogeneous height, and spontaneously arrange into short-range hexagonal ordering. Under prolonged irradiation (up to 16 hours) all dot characteristics remain largely unchanged and a small corrugation develops at long wavelengths. We interpret the formation of the dots as a result of an instability due to the sputtering yield dependence on the local surface curvature

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Production of ordered silicon nanocrystals by low-energy ion sputtering does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Production of ordered silicon nanocrystals by low-energy ion sputtering, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of ordered silicon nanocrystals by low-energy ion sputtering will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-641866

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.