Physics – Condensed Matter – Mesoscale and Nanoscale Physics
Scientific paper
2009-05-27
Nanotechnology 20, 455301 (2009)
Physics
Condensed Matter
Mesoscale and Nanoscale Physics
Scientific paper
We report nanoscale patterning of graphene using a helium ion microscope configured for lithography. Helium ion lithography is a direct-write lithography process, comparable to conventional focused ion beam patterning, with no resist or other material contacting the sample surface. In the present application, graphene samples on Si/SiO2 substrates are cut using helium ions, with computer controlled alignment, patterning, and exposure. Once suitable beam doses are determined, sharp edge profiles and clean etching are obtained, with little evident damage or doping to the sample. This technique provides fast lithography compatible with graphene, with ~15 nm feature sizes.
Bell Daryl C.
Lemme Max C.
Marcus Charles M.
Stern Laura A.
Williams Richard J.
No associations
LandOfFree
Precision Cutting and Patterning of Graphene with Helium Ions does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.
If you have personal experience with Precision Cutting and Patterning of Graphene with Helium Ions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Precision Cutting and Patterning of Graphene with Helium Ions will most certainly appreciate the feedback.
Profile ID: LFWR-SCP-O-527678