On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity

Physics – Condensed Matter – Materials Science

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

7 pages, 2 Postscript figures, accepted by Phys. Rev. B corrected typos, few minor changes

Scientific paper

10.1103/PhysRevB.72.035416

Under specific experimental circumstances, sputter erosion on semiconductor materials exhibits highly ordered hexagonal dot-like nanostructures. In a recent attempt to theoretically understand this pattern forming process, Facsko et al. [Phys. Rev. B 69, 153412 (2004)] suggested a nonlocal, damped Kuramoto-Sivashinsky equation as a potential candidate for an adequate continuum model of this self-organizing process. In this study we theoretically investigate this proposal by (i) formally deriving such a nonlocal equation as minimal model from balance considerations, (ii) showing that it can be exactly mapped to a local, damped Kuramoto-Sivashinsky equation, and (iii) inspecting the consequences of the resulting non-stationary erosion dynamics.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and On continuum modeling of sputter erosion under normal incidence: interplay between nonlocality and nonlinearity will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-529098

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.