Observation of disorder-induced weakening of electron-phonon interaction in thin noble metal films

Details Observation of disorder-induced weakening of electron-phonon interaction in thin noble metal films Observation of disorder-induced weakening of electron-phonon interaction in thin noble metal films

2003-11-03

arxiv.org/abs/cond-mat/0311031v3

Phys. Rev. B 72, 012302 (2005)

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

5 pages 4 figures

Scientific paper

10.1103/PhysRevB.72.012302

We have used symmetric normal metal-insulator-superconductor (NIS) tunnel junction pairs, known as SINIS structures, for ultrasensitive thermometry in the temperature range 50 - 700 mK. By Joule heating the electron gas and measuring the electron temperature, we show that the electron-phonon (e-p) scattering rate in the simplest noble metal disordered thin films (Cu,Au) follows a $T^4$ temperature dependence, leading to a stronger decoupling of the electron gas from the lattice at the lowest temperatures. This power law is indicative e-p coupling mediated by vibrating disorder, in contrast to the previously observed $T^3$ and $T^2$ laws.

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