Nucleation of interfacial shear cracks in thin films on disordered substrates

Details Nucleation of interfacial shear cracks in thin films on disordered substrates Nucleation of interfacial shear cracks in thin films on disordered substrates

2008-11-21

arxiv.org/abs/0811.3611v1

Physics

Condensed Matter

Materials Science

10 pages, 3 figures

Scientific paper

10.1088/1742-5468/2009/02/P02047

We formulate a theoretical model of the shear failure of a thin film tethered to a rigid substrate. The interface between film and substrate is modeled as a cohesive layer with randomly fluctuating shear strength/fracture energy. We demonstrate that, on scales large compared with the film thickness, the internal shear stresses acting on the interface can be approximated by a second-order gradient of the shear displacement across the interface. The model is used to study one-dimensional shear cracks, for which we evaluate the stress-dependent probability of nucleation of a critical crack. This is used to determine the interfacial shear strength as a function of film geometry and statistical properties of the interface.

Affiliated with

Also associated with

No associations

Rating

Nucleation of interfacial shear cracks in thin films on disordered substrates does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Nucleation of interfacial shear cracks in thin films on disordered substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nucleation of interfacial shear cracks in thin films on disordered substrates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-163844