Non-ohmic spin transport in n-type doped silicon

Details Non-ohmic spin transport in n-type doped silicon Non-ohmic spin transport in n-type doped silicon

2007-11-30

arxiv.org/abs/0711.4828v3

Phys. Rev. B 78, 165329 (2008)

Physics

Condensed Matter

Materials Science

6 pages, 7 figures

Scientific paper

10.1103/PhysRevB.78.165329

We demonstrate the injection and transport of spin-polarized electrons through n-type doped silicon with in-plane spin-valve and perpendicular magnetic field spin precession and dephasing ("Hanle effect") measurements. A voltage applied across the transport layer is used to vary the confinement potential caused by conduction band-bending and control the dominant transport mechanism between drift and diffusion. By modeling transport in this device with a Monte-Carlo scheme, we simulate the observed spin polarization and Hanle features, showing that the average transit time across the short Si transport layer can be controlled over 4 orders of magnitude with applied voltage. As a result, this modeling allows inference of a long electron spin lifetime, despite the short transit length.

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