Nano-sculptured thin film thickness variation with incidence angle

Details Nano-sculptured thin film thickness variation with incidence angle Nano-sculptured thin film thickness variation with incidence angle

2004-12-09

arxiv.org/abs/cond-mat/0412256v1

Journal of Optoelectronics and Advanced Materials 6 (2004) 1263-1268

Physics

Condensed Matter

Materials Science

5 pages, 4 figures, nanotechnology, nanomaterials

Scientific paper

In-situ monitoring and calibration of nano-sculptured thin film thickness is a critical problem due to substrate tilt angle dependent porosity and mass flux. In this letter we present an analytical model for thickness dependence on fabrication parameters for nano-sculptured films. The generality of the model includes universal Gaussian-type flux distribution, non-unity sticking coefficients, variable off-axis sensor location, and substrate tilt. The resulting equation fits well the experimental data. The results can be particularized for films deposited at normal incidence

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