Nano-Raman spectroscopy of silicon surfaces

Details Nano-Raman spectroscopy of silicon surfaces Nano-Raman spectroscopy of silicon surfaces

2010-02-13

arxiv.org/abs/1002.2692v1

Physics

Condensed Matter

Materials Science

5 pages, 7 figures, regular paper

Scientific paper

Near-field enhanced, nano-Raman spectroscopy has been successfully used to probe the surface chemistry of silicon prepared using standard wafer cleaning and processing techniques. The results demonstrate the utility of this measurement for probing the local surface chemical nano-environment with very high sensitivity. Enhancements were observed for the vibrational (stretching) modes of Si-H, F-Si-H and possibly also B-O-Si consistent with the surface treatments applied. The nano-probes did not enhance the phononic features of the silicon substrate.

Affiliated with

Also associated with

No associations

Rating

Nano-Raman spectroscopy of silicon surfaces does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Nano-Raman spectroscopy of silicon surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nano-Raman spectroscopy of silicon surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-324013