Physics – Condensed Matter – Materials Science
Scientific paper
2011-12-19
IEEE Electron Devices Letters 33 (4): Art. No. 546 April 2012
Physics
Condensed Matter
Materials Science
submitted to IEEE Electron Device Letters
Scientific paper
10.1109/LED.2012.218452
We demonstrate atomic-layer-deposited (ALD) high-k dielectric integration on two-dimensional (2D) layer-structured molybdenum disulfide (MoS2) crystals and MoS2 dual-gate n-channel MOSFETs with ALD Al2O3 as top-gate dielectric. Our C-V study of MOSFET structures shows good interface between 2D MoS2 crystal and ALD Al2O3. Maximum drain currents using back-gates and top-gates are measured to be 7.07mA/mm and 6.42mA/mm at Vds=2V with a channel width of 3 {\mu}m, a channel length of 9 {\mu}m, and a top-gate length of 3 {\mu}m. We achieve the highest field-effect mobility of electrons using back-gate control to be 517 cm^2/Vs. The highest current on/off ratio is over 10^8.
Liu Han
Ye Peide D.
No associations
LandOfFree
MoS2 Dual-Gate MOSFET with Atomic-Layer-Deposited Al2O3 as Top-Gate Dielectric does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.
If you have personal experience with MoS2 Dual-Gate MOSFET with Atomic-Layer-Deposited Al2O3 as Top-Gate Dielectric, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MoS2 Dual-Gate MOSFET with Atomic-Layer-Deposited Al2O3 as Top-Gate Dielectric will most certainly appreciate the feedback.
Profile ID: LFWR-SCP-O-212818