Morphology change of the silicon surface induced by Ar$^+$ ion beam sputtering

Details Morphology change of the silicon surface induced by Ar$^+$ ion beam sputtering Morphology change of the silicon surface induced by Ar$^+$ ion beam sputtering

2011-06-30

arxiv.org/abs/1106.6256v1

Condens. Matter Phys., 2011, vol. 14, No. 2, p. 23602:1-11

Physics

Condensed Matter

Materials Science

11 pages, 5 figures

Scientific paper

10.5488/CMP.14.23602

Two-level modeling for nanoscale pattern formation on silicon target by
Ar$^+$ ion sputtering is presented. Phase diagram illustrating possible
nanosize surface patterns is discussed. Scaling characteristics for the
structure wavelength dependence versus incoming ion energy are defined. Growth
and roughness exponents in different domains of the phase diagram are obtained.

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