Monte-Carlo Simulation of Pulsed Laser Deposition

Details Monte-Carlo Simulation of Pulsed Laser Deposition Monte-Carlo Simulation of Pulsed Laser Deposition

2002-07-24

arxiv.org/abs/cond-mat/0207581v1

Phys. Rev. B66, 45408 (2002)

Physics

Condensed Matter

Materials Science

15 pages, 8 figures

Scientific paper

10.1103/PhysRevB.66.045408

Using the Monte Carlo method, we have studied the pulsed laser deposition process at the sub-monolayer regime. In our simulations, dissociation of an atom from a cluster is incorporated. Our results indicate that the pulsed laser deposition resembles molecular beam epitaxy at very low intensity, and that it is characteristically different from molecular beam epitaxy at higher intensity. We have also obtained the island size distributions. The scaling function for the island size distribution for pulsed laser deposition is different from that of molecular beam epitaxy.

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