Metallic single-electron transistor without traditional tunnel barriers

Details Metallic single-electron transistor without traditional tunnel barriers Metallic single-electron transistor without traditional tunnel barriers

2000-11-24

arxiv.org/abs/cond-mat/0011427v1

Physics -- Uspekhi (Russia) [Usp. Fiz. Nauk (Suppl.)] 171, 113-116 (2001); J. Appl. Phys. 90, 2411 (2001)

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

5 pages incl. 4 figs

Scientific paper

10.1063/1.1389758

We report on a new type of single-electron transistor (SET) comprising two highly resistive Cr thin-film strips (~ 1um long) connecting a 1 um-long Al island to two Al outer electrodes. These resistors replace small-area oxide tunnel junctions of traditional SETs. Our transistor with a total asymptotic resistance of 110 kOhm showed a very sharp Coulomb blockade and reproducible, deep and strictly e-periodic gate modulation in wide ranges of bias currents I and gate voltages V_g. In the Coulomb blockade region (|V| < 0.5 mV), we observed a strong suppression of the cotunneling current allowing appreciable modulation curves V-V_g to be measured at currents I as low as 100 fA. The noise figure of our SET was found to be similar to that of typical Al/AlOx/Al single-electron transistors.

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