Measurement of Coulomb drag between Anderson insulators

Details Measurement of Coulomb drag between Anderson insulators Measurement of Coulomb drag between Anderson insulators

2008-02-27

arxiv.org/abs/0802.4073v1

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

4 pages, 4 figures

Scientific paper

We report observations of the Coulomb drag effect between two effectively 2-d insulating a-Si_{1-x}Nb_{x} films. We find that there only exist a limited range of experimental parameters over which we can measure a sizable linear-response transresistivity (\rho_{d}). The temperature dependence of \rho_{d} is consistent with the layers being Efros-Shklovskii Anderson insulators provided that a 3-d density of states and a localization length smaller than that obtained from the DC layer-conductivity are assumed.

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