Lithography-Free Fabrication of Graphene Devices

Physics – Condensed Matter – Mesoscale and Nanoscale Physics

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Scientific paper

We have developed a lithography-free, all-dry process for fabricating graphene devices using an ultrathin quartz filament as a shadow mask to avoid possible contamination of graphene during lithographic process. This technique was used to prepare devices for electrical transport as well as planar tunnel junction studies of n-layer graphene (nLG), with n = 1, 2, 3 and higher. We observed localization behavior and an apparent reduction of density of states (DOS) near the Fermi energy in nLG.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Lithography-Free Fabrication of Graphene Devices does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Lithography-Free Fabrication of Graphene Devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography-Free Fabrication of Graphene Devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-451771

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.