Lack of Self-affinity and Anomalous Roughening in Growth Processes

Details Lack of Self-affinity and Anomalous Roughening in Growth Processes Lack of Self-affinity and Anomalous Roughening in Growth Processes

1992-03-28

arxiv.org/abs/cond-mat/9603180v1

Physics

Condensed Matter

4 pages in Postcript format, 2 figures included in separated compressed files, uuencoded, (submitted to Phys. Rev. Lett.)

Scientific paper

We contrast analytical results of a variety of growth models involving subdiffusion, thermal noise and quenched disorder with simulations of these models, concluding that the assumed self-affinity property is more an exception than a rule. In our two dimensional models, self-affine surfaces may only appear when the roughness exponent is $\chi = 1/2$ or $\chi = 1$. A new scaling picture, which leads to more suitable ways of determining the scaling exponents, is proposed when lack of self-affinity exists.

Affiliated with

Also associated with

No associations

Rating

Lack of Self-affinity and Anomalous Roughening in Growth Processes does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Lack of Self-affinity and Anomalous Roughening in Growth Processes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lack of Self-affinity and Anomalous Roughening in Growth Processes will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-227859