Influence of the statistical shift of Fermi level on the conductivity behavior in microcrystalline silicon

Physics – Condensed Matter – Materials Science

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

10 pages, 4 figures, changed content and corrected typos

Scientific paper

10.1103/PhysRevB.77.045212

The electrical conductivity behavior of highly crystallized undoped hydrogenated microcrystalline silicon films having different microstructures was studied. The dark conductivity is seen to follow Meyer Neldel rule (MNR) in some films and anti MNR in others, depending on the details of microstructural attributes and corresponding changes in the effective density of states distributions. A band tail transport and statistical shift of Fermi level are used to explain the origin of MNR as well as anti-MNR in our samples. We present the evidence of anti-MNR in the various experimental transport data of microcrystalline silicon materials reported in literature and analyze these data together with ours to show the consistency and physical plausibility of statistical shift model. The calculated MNR parameters and other significant material parameters derived therefrom are tenable for a wide microstructural range of the microcrystalline silicon system.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Influence of the statistical shift of Fermi level on the conductivity behavior in microcrystalline silicon does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Influence of the statistical shift of Fermi level on the conductivity behavior in microcrystalline silicon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Influence of the statistical shift of Fermi level on the conductivity behavior in microcrystalline silicon will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-196202

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.