Influence of growth direction and strain conditions on the band line-up at GaSb/InSb and InAs/InSb interfaces

Details Influence of growth direction and strain conditions on the band line-up at GaSb/InSb and InAs/InSb interfaces Influence of growth direction and strain conditions on the band line-up at GaSb/InSb and InAs/InSb interfaces

1997-01-31

arxiv.org/abs/cond-mat/9702008v1

Phys.Rev.B 53 (1996),10852-10857

Physics

Condensed Matter

Materials Science

15 pages, Latex-file

Scientific paper

10.1103/PhysRevB.53.10852

First-principles full potential linearized augmented plane wave (FLAPW) calculations have been performed for lattice-mismatched common-atom III-V interfaces. In particular, we have examined the effects of epitaxial strain and ordering direction on the valence band offset in [001] and [111] GaSb/InSb and InAs/InSb superlattices, and found that the valence band maximum is always higher at the InSb side of the heterojunction, except for the common-anion system grown on an InSb substrate. The comparison between equivalent structures having the same substrate lattice constant, but different growth axis, shows that for comparable strain conditions, the ordering direction slightly influences the band line-up, due to small differences of the charge readjustment at the [001] and [111] interfaces. On the other hand, strain is shown to strongly affect the VBO; in particular, as the pseudomorphic growth conditions are varied, the bulk contribution to the band line-up changes markedly, whereas the interface term is almost constant. On the whole, our calculations yield a band line-up that decreases linearly as the substrate lattice constant is increased, showing its high tunability as a function of different pseudomorphic growth conditions. Finally, the band line-up at the lattice matched InAs/GaSb interface determined using the transitivity rule gave perfect agreement between predicted and experimental results.

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