In situ x-ray diffraction study of epitaxial growth of ordered Fe3Si films

Details In situ x-ray diffraction study of epitaxial growth of ordered Fe3Si films In situ x-ray diffraction study of epitaxial growth of ordered Fe3Si films

2007-12-13

arxiv.org/abs/0712.2180v3

Physics

Condensed Matter

Materials Science

8 pages, 3 figures

Scientific paper

10.1007/s10854-007-9530-z

Molecular beam epitaxy of Fe3Si on GaAs(001) is studied in situ by grazing incidence x-ray diffraction. Layer-by-layer growth of Fe3Si films is observed at a low growth rate and substrate temperatures near 200 degrees Celsius. A damping of x-ray intensity oscillations due to a gradual surface roughening during growth is found. The corresponding sequence of coverages of the different terrace levels is obtained. The after-deposition surface recovery is very slow. Annealing at 310 degrees Celsius combined with the deposition of one monolayer of Fe3Si restores the surface to high perfection and minimal roughness. Our stoichiometric films possess long-range order and a high quality heteroepitaxial interface.

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