In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy

Details In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy

2010-03-03

arxiv.org/abs/1003.0796v1

Physics

Condensed Matter

Materials Science

Scientific paper

We introduce an in-situ characterization method of resists used for e-beam lithography. The technique is based on the application of an atomic force microscope which is directly mounted below the cathode of an electron-beam lithography system. We demonstrate that patterns irradiated by the e-beam can be efficiently visualized and analyzed in surface topography directly after the e-beam exposure. This in-situ analysis takes place without any development or baking steps, and gives access to the chemical (or latent) image of the irradiated resist.

Affiliated with

Also associated with

No associations

Rating

In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-684629