Image quality prediction of normal-incidence X-ray/EUV multilayers in the presence of substrate and interface fabrication errors.

Physics – Optics

Scientific paper

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Coatings: X-Ray Telescopes

Scientific paper

In this paper, a detailed physical optics (interference and diffraction) treatment of surface scatter phenomena due to optical fabrication errors in X-ray/EUV multilayers over the entire relevant range of spatial frequencies is described. The effects on the scattered radiation field of a variety of assumptions concerning the statistical correlation of interface roughness will be explored. It is well known that, at soft X-ray wavelengths, substrate figure errors blur the image. It will be shown that uncorrelated interface microroughness reduces the reflectance of multilayers in addition to causing wide angle scatter, and that small-angle scatter from mid spatial frequency optical fabrication errors limits the achievable image quality (fractional encircled energy.)

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