How ripples turn into dots: modeling ion-beam erosion under oblique incidence

Details How ripples turn into dots: modeling ion-beam erosion under oblique incidence How ripples turn into dots: modeling ion-beam erosion under oblique incidence

2005-09-16

arxiv.org/abs/cond-mat/0509437v2

Physics

Condensed Matter

Materials Science

11 pages, 4 figures, submitted for publication, revised version

Scientific paper

10.1209/epl/i2006-10349-4

Pattern formation on semiconductor surfaces induced by low energetic ion-beam erosion under normal and oblique incidence is theoretically investigated using a continuum model in form of a stochastic, nonlocal, anisotropic Kuramoto-Sivashinsky equation. Depending on the size of the parameters this model exhibits hexagonally ordered dot, ripple, less regular and even rather smooth patterns. We investigate the transitional behavior between such states and suggest how transitions can be experimentally detected.

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