High temperature gate control of quantum well spin memory

Details High temperature gate control of quantum well spin memory High temperature gate control of quantum well spin memory

2003-05-16

arxiv.org/abs/cond-mat/0305396v1

Physics

Condensed Matter

4 pages, 4 EPS figures, REVTeX

Scientific paper

10.1103/PhysRevLett.91.246601

Time-resolved optical measurements in (110)-oriented GaAs/AlGaAs quantum wells show a ten-fold increase of the spin-relaxation rate as a function of applied electric field from 20 to 80 kV cm-1 at 170 K and indicate a similar variation at 300 K, in agreement with calculations based on the Rashba effect. Spin relaxation is almost field-independent below 20 kV cm-1 reflecting quantum well interface asymmetry. The results indicate the achievability of voltage-gateable spin-memory time longer than 3 ns simultaneously with high electron mobility.

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